KARAKTERISASI LAPISAN TIPIS ALLOY NiFe HASIL ELEKTRODEPOSISI PADA SUBSTRAT Cu DAN ITO

Oleh :
Erti Fatkul Jannah - M0202027 -

ABSTRACT The Characterization of NiFe Alloy Thin Films as the Result of Electrodeposition on Cu and ITO Substrate By Erti Fatkul Jannah M0202027 In this research the effect of Cu and Indium Tin Oxide (ITO) substrate upon the growth of crystal structure, morphology structure and magnetoresistance ratio of thin film has been explored. The growth of Ni-Fe thin film has been done by electrodeposition method. Crystal structure was analyzed with XRD, morphology structure was examined by Scanning electron microscope (SEM) and magnetoresistance ratio was determined by two point probe method. XRD spectrum show that the substrate influences to crystal structure. Thin films produced were in the form of polycrystalline constituted of Ni-Fe with structure of fcc (face center cubic). The Ni-Fe thin film formed crystal planes (111), (200) and (220) on Cu substrate, (111) and (200) on ITO substrate. The result of SEM show that surface morphology of substrate has influence morphology structure of thin film. The result of magnetoresistance ratio measurement show that the substrate influences ratio of magnetoresistance. The Ni-Fe thin film formed has ratio of magnetoresistance 8.9 % and 10.9 % on Cu and ITO substrate, respectively. Key word: NiFe, electrodeposition, morphology, crystal structure.