KARAKTERISASI LAPISAN TIPIS ALLOY NiFe HASIL ELEKTRODEPOSISI PADA SUBSTRAT Cu DAN ITO
Penulis Utama
:
Erti Fatkul Jannah
NIM / NIP
:
M0202027
×ABSTRACT
The Characterization of NiFe Alloy Thin Films as the Result of Electrodeposition on Cu and ITO Substrate
By
Erti Fatkul Jannah
M0202027
In this research the effect of Cu and Indium Tin Oxide (ITO) substrate upon the growth of crystal structure, morphology structure and magnetoresistance ratio of thin film has been explored. The growth of Ni-Fe thin film has been done by electrodeposition method. Crystal structure was analyzed with XRD, morphology structure was examined by Scanning electron microscope (SEM) and magnetoresistance ratio was determined by two point probe method. XRD spectrum show that the substrate influences to crystal structure. Thin films produced were in the form of polycrystalline constituted of Ni-Fe with structure of fcc (face center cubic). The Ni-Fe thin film formed crystal planes (111), (200) and (220) on Cu substrate, (111) and (200) on ITO substrate. The result of SEM show that surface morphology of substrate has influence morphology structure of thin film. The result of magnetoresistance ratio measurement show that the substrate influences ratio of magnetoresistance. The Ni-Fe thin film formed has ratio of magnetoresistance 8.9 % and 10.9 % on Cu and ITO substrate, respectively.
Key word: NiFe, electrodeposition, morphology, crystal structure.
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Penulis Utama
:
Erti Fatkul Jannah
Penulis Tambahan
:
1. Erti Fatkul Jannah
NIM / NIP
:
M0202027
Tahun
:
2007
Judul
:
KARAKTERISASI LAPISAN TIPIS ALLOY NiFe HASIL ELEKTRODEPOSISI PADA SUBSTRAT Cu DAN ITO
Edisi
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Imprint
:
SURAKARTA - FMIPA - 2007
Program Studi
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S-1 Fisika
Kolasi
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Sumber
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Kata Kunci
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Jenis Dokumen
:
Skripsi
ISSN
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ISBN
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Link DOI / Jurnal
:
-
Status
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Public
Pembimbing
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Penguji
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Catatan Umum
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Fakultas
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